- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/38 - Treatment before imagewise removal, e.g. prebaking
Patent holdings for IPC class G03F 7/38
Total number of patents in this class: 1297
10-year publication summary
|
65
|
111
|
154
|
149
|
149
|
107
|
80
|
104
|
74
|
17
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Shin-Etsu Chemical Co., Ltd. | 5132 |
181 |
| FUJIFILM Corporation | 27102 |
127 |
| Sumitomo Chemical Company, Limited | 8808 |
105 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
101 |
| Tokyo Ohka Kogyo Co., Ltd. | 1481 |
79 |
| JSR Corporation | 2476 |
71 |
| Tokyo Electron Limited | 11599 |
70 |
| Applied Materials, Inc. | 16587 |
42 |
| Rohm and Haas Electronic Materials LLC | 637 |
29 |
| Nissan Chemical Industries, Ltd. | 1822 |
28 |
| Merck Patent GmbH | 5909 |
23 |
| International Business Machines Corporation | 60644 |
18 |
| Samsung Electronics Co., Ltd. | 131630 |
17 |
| Carbon, Inc. | 385 |
16 |
| Lam Research Corporation | 4775 |
13 |
| Inpria Corporation | 96 |
13 |
| Central Glass Company, Limited | 1244 |
11 |
| Mitsubishi Gas Chemical Company, Inc. | 3188 |
11 |
| Osaka University | 3143 |
11 |
| Nissan Chemical Corporation | 1725 |
11 |
| Other owners | 320 |